Low-temperature deposited ZnO thin films on the flexible substrate by cathodic vacuum arc technology

► Low-temperature deposited un-doped ZnO films are successful prepared on PET substrates by using CAPD system. ► The effect of film thickness on the microstructure, optical and electrical properties of low-temperature deposited un-doped ZnO films by CAPD were investigated and discussed. ► This report may give significant information about how to deposit high quality ZnO thin films with desired optical and/or electrical properties at a low temperature using CAPD on the applications to be a newer alternatives to ITO in the display industries.