Laser-induced front side etching of fused silica with XeF excimer laser using thin metal layers

► We study laser-induced front side etching of fused silica with a XeF excimer laser. ► Different metal layers as absorber are used. ► The LIFE method allows nm-precision etching with etching depths up to 150 nm. ► The measurement results are compared to the results calculated by a thermal model.