Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition

► Highly c-axis oriented HT-LixCoO2 thin films are grown on (0 0 0 1) Al2O3 substrates by PLD. ► Deposition conditions change both surface roughness and resistivity of the thin films. ► The CP-AFM revealed very good surface roughness is an important issue in exploiting this material in novel devices. ► PLD is a promising technique for the growth of thin films of materials that contain volatile components.