Effect of polymer binder on surface texturing by photoembossing

► Relief height in PMMA-DPPHA films of high aspect ratio are created by photoembossing. ► New mixtures for photoembossing are presented, containing greater monomer content. ► At high monomer contents, mixtures are solid at room temperature allowing mask exposure. ► Greater material flux during photo-polymerisation. ► This results in an increase in relief height by 50%.