I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking
Keywords: PPaP; positive-tone photoresist that can be patterned after photo-crosslinking; DHDA; 2,5âdimethylâ2,5âhexanediol diacrylate; NIT; Nâhydroxynaphthalimide triflate; PAG; photo acid generator; PEB; post-exposure bake; GPC; gel permeation chromatogra