Thermal stability of magnetron sputtered amorphous Si2C

► We investigated the thermal stability of thin films of amorphous Si2C at 800 °C. ► The films were investigated by means of XPS, XRD, AFM, SEM and AES. ► Annealing led to the formation of new SiC bonds. ► Crystallization of silicon took place during thermal annealing. ► Small particles of silicon were formed on the surface of the film.