Evaluation of the nanomechanical properties of vanadium and native oxide vanadium thin films prepared by RF magnetron sputtering

- V films of 50, 75, 100 nm thickness were deposited on Si by RF magnetron sputtering.
- We studied structural/mechanical properties by XRD, FE-SEM, AFM, and nanoindentation.
- The hardness increased from 9.0 to 14.0 GPa for 100 to 50 nm.
- The modulus showed no correlation with thickness or native oxide formation.
- Native oxide formation resulted in grain enlargement and roughness reduction.