کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5357481 1503608 2015 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Atomic layer deposition to prevent metal transfer from implants: An X-ray fluorescence study
ترجمه فارسی عنوان
رسوب لایه اتمی برای جلوگیری از انتقال فلز از اپیلاسیون: یک مطالعه فلورسنت اشعه ایکس
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
چکیده انگلیسی
We show that Atomic Layer Deposition is a suitable coating technique to prevent metal diffusion from medical implants. The metal distribution in animal bone tissue with inserted bare and coated Co-Cr alloys was evaluated by means of micro X-ray fluorescence mapping. In the uncoated implant, the migration of Co and Cr particles from the bare alloy in the biological tissues is observed just after one month and the number of particles significantly increases after two months. In contrast, no metal diffusion was detected in the implant coated with TiO2. Instead, a gradient distribution of the metals was found, from the alloy surface going into the tissue. No significant change was detected after two months of aging. As expected, the thicker is the TiO2 layer, the lower is the metal migration.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 359, 30 December 2015, Pages 215-220
نویسندگان
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