Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions

► Tungsten nitride thin films deposited on the stainless steel-304 substrates, using a low energy plasma focus device. ► Effects of distance from anode tip investigated at three different angular positions with respect to anode axis (0°, 10° and 30°). ► Structural properties of deposited films analyzed using XRD spectra. ► Micro-structure, surface morphology and hardness of the films analyzed using SEM and AFM images and micro-hardness measurements.