کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5359436 | 1388247 | 2009 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of deposition temperature on boron-doped carbon coatings deposited from a BCl3-C3H6-H2 mixture using low pressure chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A mixture of propylene, hydrogen and boron trichloride was used to fabricate boron-doped carbon coatings by using low pressure chemical vapor deposition (LPCVD) technique. Effect of deposition temperature on deposition rate, morphologies, compositions and bonding states of boron-doped carbon coatings was investigated. Below 1273Â K, the deposition rate is controlled by reaction dynamics. The deposition rate increases with increasing deposition temperature. The activation energy is 208.74Â kJ/mol. Above 1273Â K, the deposition rate decreases due to smaller critical radius rc and higher nuclei formation rate J with increasing temperature. Scanning electron microscopy shows that the structure changes from glass-like to nano-laminates with increasing deposition temperature. The boron concentration decreases with increasing deposition temperature, corresponding with increasing carbon concentration. The five types of bonding states are B-C, B-sub-C, BC2O, BCO2 and B-O. B-sub-C and BC2O are the main bonding states. The reactions are dominant at all temperatures, in which the B-sub-C and PyC are formed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issue 21, 15 August 2009, Pages 8761-8768
Journal: Applied Surface Science - Volume 255, Issue 21, 15 August 2009, Pages 8761-8768
نویسندگان
Yongsheng Liu, Litong Zhang, Laifei Cheng, Wenbin Yang, Yongdong Xu,