کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5359772 | 1503705 | 2009 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of sputtering parameters on surface morphology and catalytic efficiency of thin platinum films
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
This paper presents a research on the influence of sputtering parameters (dc power, argon pressure) and film thickness/metal loading on the surface structure and morphology of platinum thin films and their catalytic activity toward the oxygen reduction in acid aqueous solutions. The properties of the sputtered films were studied using scanning electron microscopy (SEM), X-ray diffraction (XRD), and the electrochemical methods of cyclic voltammetry and steady state polarisation. It was found that low sputtering power and high sputtering pressure lead to deposition of mechanically stable crystalline Pt films with extended surface area. Optimal sputtering parameters of 68Â mTorr argon pressure and 100Â W dc power were determined. The films deposited at these conditions possess homogeneous, highly developed surface with columnar structure. The increase in thickness results in essential epitaxial growth of the platinum particles with distinct [1Â 1Â 1] orientation. The best utilization of the catalyst (1.10â3Â AÂ cmâ2Â nmPtâ1 mass activity determined from the polarisation curves at 0.4Â V) was achieved at 120-130Â nm film thickness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issues 13â14, 15 April 2009, Pages 6479-6486
Journal: Applied Surface Science - Volume 255, Issues 13â14, 15 April 2009, Pages 6479-6486
نویسندگان
E. Slavcheva, G. Ganske, G. Topalov, W. Mokwa, U. Schnakenberg,