کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5360059 | 1503687 | 2013 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Residual stress study of nanostructured zirconia films obtained by MOCVD and by sol-gel routes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Residual stress study of nanostructured zirconia films obtained by MOCVD and by sol-gel routes Residual stress study of nanostructured zirconia films obtained by MOCVD and by sol-gel routes](/preview/png/5360059.png)
چکیده انگلیسی
The residual stress study of nanostructured zirconia films obtained by two deposition techniques, MOCVD and sol-gel used in this work, shows the advantages and limitations of each process. The MOCVD technique allows obtaining dense and thick zirconia films. Sol-gel deposition led to thinner zirconia films compared to those obtained by MOCVD, but the possible control of deposition parameters including multi-layers deposition is an advantage for the development of dense and homogeneous zirconia films. The crystalline structures and residual stress levels of nanostructured films have been studied by X-ray diffraction method; the film morphology has been analyzed by FEG-MEB.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 276, 1 July 2013, Pages 138-146
Journal: Applied Surface Science - Volume 276, 1 July 2013, Pages 138-146
نویسندگان
M. Jouili, M. Andrieux, P. Ribot, A. Bleuzen, G. Fornasieri, V. Ji,