کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5361059 | 1388269 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High-temperature oxidation resistant (Cr, Al)N films synthesized using pulsed bias arc ion plating
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High-temperature oxidation resistant (Cr, Al)N films synthesized using pulsed bias arc ion plating High-temperature oxidation resistant (Cr, Al)N films synthesized using pulsed bias arc ion plating](/preview/png/5361059.png)
چکیده انگلیسی
(Cr, Al)N films were deposited by pulsed bias arc ion plating on HSS and 316L stainless steel substrates. With pulsed substrate bias ranging from â100 V to â500 V, the effect of pulsed bias on film composition, phase structure, deposition rate and mechanical properties was investigated by EDX, XRD, SEM, nanoindentation and scratch measurements. The high-temperature (up to 900 °C) oxidation resistance of the films was also evaluated. The results show that Al contents and deposition rates decrease with increasing pulsed bias and the ratio of (Cr + Al)/N is almost constant at 0.95. The as-deposited (Cr, Al)N films crystallize in the pseudo-binary (Cr, Al)N and Al phases. The film hardness increases with increasing bias and reaches the maximum 21.5 GPa at â500 V. The films deposited at â500 V exhibit a high adhesion force, about 70 N, and more interestingly good oxidation resistance when annealed in air at 900 °C for 10 h.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 22, 15 September 2008, Pages 7149-7154
Journal: Applied Surface Science - Volume 254, Issue 22, 15 September 2008, Pages 7149-7154
نویسندگان
Min Zhang, Guoqiang Lin, Guoying Lu, Chuang Dong, Kwang Ho Kim,