Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

► A high power pulsed magnetron sputtering was explored in depositing TiC:H thin film on a stainless steel 304. ► The sputtering processed TiC:H thin film/stainless steel 304 system exhibits minimal residual stress. ► The TiC:H thin film adheres firmly to the substrate showing the effectiveness of this process.