کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5361670 | 1388275 | 2009 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: A new laser direct etching method of indium tin oxide electrode for application to alternative current plasma display panel A new laser direct etching method of indium tin oxide electrode for application to alternative current plasma display panel](/preview/png/5361670.png)
For cost effective fabrication and time of alternative current plasma display panels (AC PDPs), an indium tin oxide (ITO) layer was patterned directly with a Q-switched diode pumped Nd:YVO4 laser (λ = 1064 nm). As experimental results, 500 mm/s scan speed with 40 kHz repetition rate was suitable for the application to AC PDP ITO electrode. In comparison with the chemically wet-etched ITO patterns by photolithography method, laser-ablated ITO patterns showed the formation of shoulders at the edge of the ITO lines and a ripple-like structure of the etched bottom. By dipping the laser-ablated ITO films in the chemical etching solution for 30 s at 50 °C, the shoulders were effectively removed without affecting the discharging properties of AC PDP.
Journal: Applied Surface Science - Volume 255, Issue 24, 30 September 2009, Pages 9843-9846