Manufacture, microstructure and mechanical properties of WTaN nano-structured hard films

► WTaN hard films were sputter deposited on silicon substrate using direct current magnetron sputtering technique. ► WTaN coatings were consisted of WTaN solid solution face centered cubic structure. ► Hardness of WTaN coatings reached maximum value of 38 GPa at the Ta content of 31 at.%. ► The adhesion strength of WTaN coatings to substrate varied in the range of 27-35 N.