Nanomechanical properties of NbN films prepared by pulsed laser deposition using nanoindendation

► NbN thin films were successfully deposited on Si(1 0 0) by pulsed laser deposition (PLD) in nitrogen background. ► Structural and mechanical properties of NbN thin films were investigated using X-ray diffraction, atomic force microscopy, and nanoindentation. ► NbN films reveal simple cubic δ-NbN structure with the corresponding reflections of (1 1 1), (2 0 0), and (2 2 0) planes. ► The average modulus of the film is 420 ± 60 GPa. ► The hardness of the film increases monotonically from an average of 12 GPa for deep indents (Si substrate) to an average of 25 GPa.