کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5362378 1388284 2008 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructure, porosity and roughness of RF sputtered oxide thin films: Characterization and modelization
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Microstructure, porosity and roughness of RF sputtered oxide thin films: Characterization and modelization
چکیده انگلیسی
According to the simple model proposed, the films are made of three layers. From the bottom to the top of the film, the first one at the interface with the substrate is 100% dense. The second layer is made of cylindrical rods set up according to a compact plane. Its porosity is due to the lattice interstices. Hemispheric domes covering each rod make up the third layer, which displays a degree of roughness related to the shape and the hexagonal arrangement of the domes. The surface enhancement factor (SEF), the porosity and roughness, calculated from the model, are in corroboration with the experimental values. The porosity factor is however slightly underestimated by the model for very porous samples.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 18, 15 July 2008, Pages 5796-5802
نویسندگان
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