The effect of surfactants on the electropolishing behavior of copper in orthophosphoric acid

The improvement produced in EP by the surfactants was due to adsorption of them on the anode surface.The studied surfactants produced a beneficial effect on the EP of copper in H3PO4 acid solution.The lowest roughness value (47.57 μm) was obtained in presence of 1 × 10−2 M Triton X-100.