کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5362783 1388293 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors
چکیده انگلیسی
TiO2 single layers and TiO2/SiO2 high reflectors (HR) are prepared by electron beam evaporation at different TiO2 deposition rates. It is found that the changes of properties of TiO2 films with the increase of rate, such as the increase of refractive index and extinction coefficient and the decrease of physical thickness, lead to the spectrum shift and reflectivity bandwidth broadening of HR together with the increase of absorption and decrease of laser-induced damage threshold. The damages are found of different morphologies: a shallow pit to a seriously delaminated and deep crater, and the different amorphous-to-anatase-to-rutile phase transition processes detected by Raman study. The frequency shift of Raman vibration mode correlates with the strain in film. Energy dispersive X-ray analysis reveals that impurities and non-stoichiometric defects are two absorption initiations resulting to the laser-induced transformation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issue 9, 15 February 2009, Pages 4733-4737
نویسندگان
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