MicroRaman study of the effect of oxide layer on nitriding of Ti-6Al-4V

Ti-6Al-4V samples were subjected to nitrogen ion implantation and low pressure RF plasma nitriding in a PIII equipment after chemical etching in Kroll's reagent. The samples were characterized by optical microscopy, AFM, microRaman, XRD and micro hardness measurements. From microRaman, oxides of titanium were found in the inter-granular β region whereas the oxide on the α region was extremely thin. The oxide on the β region was found to be amorphous and from intensity dependent Raman spectra, it was found to have a layered structure. The top layer was rutile and the inner layer anastase. Presence of Ti2O3 was also found. After PIII treatment at 600 °C, microRaman showed the presence of nitride in both the regions and the oxide was absent in the β regions. Also, from intensity dependent Raman spectra, it was found that in-take of nitrogen by β regions was higher. The oxide layer remained unaffected after plasma nitriding. Nitride presence in the α was established by microRaman. Even though Raman spectra from β regions were nearly the same as that of oxide, presence of nitrogen was indicated by the spectra. XRD studies of implanted and nitrided samples showed the prsence of TiN and Ti2N in implanted sample and presence of Ti2N in the nitrided sample. The β regions were found to have higher microhardness values after PIII and nitriding treatments. This is attributed to the deeper diffusion of nitrogen in these regions.