The microstructure and optical properties of crystallized hydrogenated silicon films prepared by very high frequency glow discharge

► Hydrogenated nanocrystalline Si films were prepared by PECVD with an excitation frequency of 81.36 MHz. ► A modified four-layer-medium transmission model based on the envelope method was employed to determine optical constants of the obtained films. ► The samples prepared by very high frequency glow discharge have higher absorption coefficients due to their better compactness and lower defect density.