Polishing behavior of PS/CeO2 hybrid microspheres with controlled shell thickness on silicon dioxide CMP

► Organic-inorganic composite microspheres with PS as a core and CeO2 nanoparticles as a shell were synthesized by in situ chemical precipitation. ► The shell thickness of the composite microspheres could be turned. The whole process required neither surface treatment for PS microspheres nor additional surfactant or stabilizer. ► A possible mechanism for the formation of PS/CeO2 composite microspheres was discussed. ► The effects of CeO2 shell thickness of the PS/CeO2 composite abrasives on oxide CMP performance were investigated.