Carbon nitride films by RF plasma assisted PLD: Spectroscopic and electronic analysis

▶ In this paper we studied the effect of RF plasma on a-CNx films deposition. ▶ Nitrogen plasma resulted in better thickness, quality and Nitrogen uptake of films. ▶ The OES evidenced a reactivity enhancement of Nitrogen molecules in the RF plasma. ▶ The electrical resistivity is higher, due to a greater number of C-N bond formation.