کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5365491 | 1388331 | 2010 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Epitaxial ZnO films grown on ZnO-buffered c-plane sapphire substrates by hydrothermal method Epitaxial ZnO films grown on ZnO-buffered c-plane sapphire substrates by hydrothermal method](/preview/png/5365491.png)
ZnO films are hydrothermally grown on ZnO-buffered c-plane sapphire substrates at a low temperature of 70 °C. A radio-frequency (RF) reactive magnetron sputtering has been used to grow the ZnO buffer layers. X-ray diffraction, scanning electron microscopy, and room temperature photoluminescence are carried out to characterize the structure, morphology and optical property of the films. It is found that the films are stress-free. The epitaxial relationship between the ZnO film and the c-plane sapphire substrate is found to be ZnO (0 0 0 1)||Al2O3 (0 0 0 1) in the surface normal and ZnO[101¯0]||Al2O3[112¯0] in plane. Sapphire treatment, as such acid etching, nitridation, and oxidation are found to influence the nucleation of the film growth, and the buffer layers determine the crystalline quality of the ZnO films. The maximum PL quantum efficiency of ZnO films grown with hydrothermal method is found to be about 80% of single-crystal ZnO.
Journal: Applied Surface Science - Volume 256, Issue 22, 1 September 2010, Pages 6743-6747