کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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5366022 | 1388342 | 2007 | 6 صفحه PDF | دانلود رایگان |

We report a study of the annealing temperature and time on Ag catalyst size and density for subsequent growth of ZnO nanorods by catalyst-driven molecular beam epitaxy (MBE). Two different substrates (SiO2 and SiNX) for the Ag deposition were used and the thickness of the Ag held constant at 25 à . Annealing between 600 and 800 °C produced Ag cluster sizes in the range 8-30 nm diameter on SiO2 and 10-65 nm on SiNX with a cluster density from 100 to 2500 mmâ2 for SiO2 and 30 to 1900 mmâ2 for SiNX. ZnO nanorods grown on these clusters show single-crystal, wurtzite-phase nature and strong band-edge photoluminescence at 380 nm. The nanorods can also be grown selectively on lithographically-patterned dielectric stripes with Ag clusters formed on top by e-beam evaporation and annealing.
Journal: Applied Surface Science - Volume 253, Issue 10, 15 March 2007, Pages 4620-4625