Properties of MgxZn1−xO thin films sputtered in different gases

MgxZn1−xO alloy films were prepared on sapphire substrates using Ar and N2 as the sputtering gases. The effect of the sputtering gas on the structural, optical and electrical properties of the MgxZn1−xO films was studied. By using N2 as the sputtering gas, the MgxZn1−xO film shows p-type conductivity and the band gap is larger than that employing Ar as the sputtering gas. The reason for this phenomenon is thought to be related to the reaction between N-O or N-Zn, and the N-doping.