کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5367461 | 1388366 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Band bending and band alignment at HfO2/HfSixOy/Si interfaces
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Band bending and band alignment at HfO2/HfSixOy/Si interfaces Band bending and band alignment at HfO2/HfSixOy/Si interfaces](/preview/png/5367461.png)
چکیده انگلیسی
Band bending and band alignment at HfO2/SiO2/Si and HfO2/Hf/SiO2/Si interfaces were investigated using X-ray photoelectron spectroscopy. After Hf-metal pre-deposition, a 0.55Â eV band bending in Si and a 1.80Â eV binding energy decrease for Hf 4f and O 1s of HfO2 were observed. This was attributed to the introduction of negative space charges at interface by Hf pre-deposition. Band bending decrease and synchronous binding energy increases of O 1s and Hf 4f for HfO2 were observed during initial Ar+ sputtering of the Hf pre-deposited sample. This was interpreted through the neutralization of negative space charges by sputtering-induced oxygen vacancies.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 7, 30 January 2007, Pages 3508-3511
Journal: Applied Surface Science - Volume 253, Issue 7, 30 January 2007, Pages 3508-3511
نویسندگان
Weijie Song, Michiko Yoshitake, Ruiqin Tan, Isao Kojima,