کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5367557 1388368 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of ultrathin nanocomposite SiO2:nc-Au structures by Pulsed Laser Deposition
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Formation of ultrathin nanocomposite SiO2:nc-Au structures by Pulsed Laser Deposition
چکیده انگلیسی
A method for the formation of Au nanocrystal (nc) arrays embedded in an ultrathin SiO2 layer in one vacuum cycle is proposed. The method is based on the co-deposition in vacuum of ∼1 nm thick uniform Si-Au amorphous layer at a specific composition ratio by Pulsed Laser Deposition on the pre-oxidized Si(1 0 0) substrate, followed by its oxidation in the glow discharge oxygen plasma at room temperature, resulting in the precipitation of Au ncs at the bottom interface and/or at the surface of the forming SiO2 layer. The capping SiO2 layer is formed by the glow discharge plasma oxidation of further deposited ultrathin Si layer. Au ncs 2-5 nm in size and with the separation of ∼3-20 nm from each other segregate during the oxidation of Au-Si mixture as evidenced by transmission electron microscopy (TEM). The evolution of Au and Si chemical state upon each step of the SiO2:nc-Au nanocomposite structure formation is monitored in situ by X-ray photoelectron spectroscopy (XPS). The metrology of nanocomposite SiO2:nc-Au structures describing the space distribution of Au ncs as a function of Au/Si ratio is presented.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issue 10, 1 March 2009, Pages 5355-5358
نویسندگان
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