کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5367653 | 1388370 | 2011 | 4 صفحه PDF | دانلود رایگان |
Rapid thermal annealing (RTA) is a general approach to improve the crystallinity of thin solid films. In this study, we investigated the effects of RTA on the structural and electrical properties of Na-doped ZnMgO ï¬lms grown by pulsed laser deposition. X-ray diffraction (XRD) results showed that the crystallinity of the Na-doped ZnMgO ï¬lms was improved with RTA at 400-700 °C, and the grain size became larger as the annealing temperature increased. Moreover, room-temperature photoluminescence (PL) measurements demonstrated decent optical quality of the as-deposited and annealed Na-doped ZnMgO ï¬lms. Hall-effect measurements showed that the hole concentration increased from 4.9 Ã 1014 to 6.6 Ã 1015 cmâ3 to 1.9 Ã 1017 to 8.3 Ã 1017 cmâ3 while the resistivity and the Hall mobility decreased after the RTA treatments. The conduction type of the films converted from p to n when the annealing temperature is higher than 800 °C. Therefore a wide temperature window to obtain reasonable p-type Na-doped ZnMgO films by RTA is achieved. It is important because RTA is generally needed to obtain p-type Ohmic contact in the fabrication processes of light-emitting diodes (LEDs).
Research highlights⺠It has been reported that the Na-doped ZnMgO films show p-type conductivity. However, the effect of annealing temperature on the p-type ZnMgO conductivity is not well understood. In this study, we demonstrate that the electrical properties of the p-type ZnMgO are strongly dependent on annealing temperature. ⺠The crystallinities of the Na doped ZnMgO ï¬lms were improved with RTA at 400-700 °C, the crystal size get larger as the annealing temperature growed. The as-deposited and annealed Na-doped ZnMgO ï¬lms showed great optical efficiency from the PL measurements. The hole concentration increased while the resistivity and the Hall mobility decreased after annealed at 400-700 °C. The carrier type converted from p to n at an annealing temperature higher than 800 °C. ⺠From our experiments, we can find a wide temperature window for achieving reasonable p-type by RTA, which is important because RTA is generally needed to get p-type Ohmic contact when fabricating LED.
Journal: Applied Surface Science - Volume 257, Issue 14, 1 May 2011, Pages 5927-5930