کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5368314 1388390 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study of the influence of the acrylic acid plasma parameters on silicon and polyurethane substrates using XPS and AFM
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Study of the influence of the acrylic acid plasma parameters on silicon and polyurethane substrates using XPS and AFM
چکیده انگلیسی

XPS and AFM have been used to investigate surface modifications produced by acrylic acid (AA) vapor plasma treatment of silicon (Si)(1 0 0) substrates and polyurethanes (PUs) membranes. XPS analyses of Si and PUs treated substrates at low plasma power (5-20 W) revealed the formation of a thin film on the surfaces, which chemically resembles the poly(acrylic acid) film conventionally synthesised. No signal of the Si substrate could be seen under these low plasma power applications on silicon. However, when the plasma power is higher than 30 W one can clearly see XPS silicon signatures. AFM measurements of silicon substrates treated with AA plasma at low power (5-20 W) showed the formation of a thin polymer film of about 220-55 nm thickness. Further, applications of high plasma power (30-100 W) displayed a marked difference from low plasma modifications and it was found sputtering of the silicon substrate. Pervaporation results of AA plasma treated PUs membranes revealed that the selectivity for the separation of methanol from methyl-t-butyl ether is higher at 100 W and 1 min treatment time, than the other conditions studied. This last finding is discussed concerning the surface modifications produced on plasma treated silicon substrates and PU membranes.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 1, 31 October 2007, Pages 131-134
نویسندگان
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