کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5368831 1388410 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Sputtering yields of PMMA films bombarded by keV C60+ ions
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Sputtering yields of PMMA films bombarded by keV C60+ ions
چکیده انگلیسی

A quartz crystal microbalance (QCM) has been used to determine total-mass sputtering yields of PMMA films by 1-16 keV C60+,2+ ion beams. Quantitative sputtering yields for PMMA are presented as mass loss per incident ion Ym. Mass-lost rate QCM data show that a 13 keV C60 cluster leads to emission equivalent to 800 PMMA molecules per ion. The power law obtained for the increase in sputtering yield with primary ion energy is in good agreement those predicted by “thermal spike” regime and MD models, when crater sizes are used to estimate sputtering.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 19, 30 July 2006, Pages 6533-6536
نویسندگان
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