کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5368965 1388414 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study on contamination of projection optics surface for extreme ultraviolet lithography
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Study on contamination of projection optics surface for extreme ultraviolet lithography
چکیده انگلیسی

Ru-capped Mo/Si multilayer mirrors were irradiated by EUV in a vacuum atmosphere with ethanol or decane gas, and their reflectivity changes by contamination were investigated by changing the amount of introduced gas. The reflectivity hardly decreased by EUV irradiation in the ethanol-introduced atmosphere. On the other hand, the reflectivity decreased by about 5% in the decane-introduced atmosphere at a decane pressure of PDecane = 1.3 × 10−4 Pa, an EUV power of about 200 mW/mm2, and an EUV dose of 150 J/mm2. EUV irradiation to the Ru-capped multilayer mirrors was also performed in the presence of water vapor and decane. The surface oxidation by EUV irradiation with a water vapor pressure of PH2O=1.3×10−5Pa was controlled by the introduction of decane at a pressure of PDecane = 7.0 × 10−7 to 1.3 × 10−6 Pa.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 256, Issue 4, 30 November 2009, Pages 1171-1175
نویسندگان
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