Laser-induced thermal desorption mass spectrometry of functionalized silicon surfaces

Functionalization of materials and laser patterning of chemisorbed layers play an increasing role in tailoring and structuring surface properties on the nanoscale. An attractive method of investigating organic functionalizations is laser-induced thermal desorption (LITD). The analysis of well-defined H- and D-terminated Si(1 1 1)-(1 × 1):H(D) surfaces was used to quantify the LITD technique. Moreover, oxidized silicon surfaces were functionalized with trimethylsilyl (TMS) and (3,3,3-trifluoropropyl)-dimethylsilyl (TFP) hydrophobic end groups. The samples were irradiated normal to the surface with focused XeCl laser pulses. The desorbed species were monitored at an oblique angle and their time-of-flight (TOF) distributions were measured with a quadrupole mass analyzer. The TOF temperatures of silicon were calibrated for different laser pulse energies by desorption of H2 and D2. In the LITD experiments, the desorption of trimethylsilanol groups was observed for TMS terminations, indicating that essentially the whole molecule desorbs from the surface. The TOF data could be fitted to Maxwellian distributions, providing the desorption yield of the emitted species, their mass, and temperature. On the other hand, several characteristic fragments were found for the TFP-terminated surface. The TOF distributions indicate that the fragments detected with the analyzer derived from different desorbed species.