کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5370246 1388479 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Nanoimprint lithography using IR laser irradiation
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Nanoimprint lithography using IR laser irradiation
چکیده انگلیسی

A new technique called “infrared laser-assisted nanoimprint lithography” was utilised to soften the thermoplastic polymer material mR-I 8020 during nanoimprint lithography. A laser setup and a sample holder with pressure and temperature control were designed for the imprint experiments. The polymer was spin coated onto crystalline Si <1 1 1> substrates. A prepatterned Si <1 1 1> substrate, which is transparent for the CO2 laser irradiation, was used as an imprint stamp as well. It was shown, that the thermoplastic resist mR-I 8020 could be successfully imprinted using the infrared CW CO2 laser irradiation (λ = 10.6 μm). The etching rate of the CO2 laser beam irradiated mR-I 8020 resist film under O2 RF (13.56 MHz) plasma treatment and during O2 reactive ion beam etching was investigated as well.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 2, 15 November 2006, Pages 646-650
نویسندگان
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