کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5370318 | 1388483 | 2006 | 7 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Preparation of fluorocarbon thin film deposited by soft X-ray ablation and its electrical characteristics and thermal stability Preparation of fluorocarbon thin film deposited by soft X-ray ablation and its electrical characteristics and thermal stability](/preview/png/5370318.png)
Fluorocarbon films were deposited by soft X-ray ablation of polytetrafluoroethylene (PTFE) and characterized as low-dielectric-constant interlayer dielectrics. Very rapid deposition of such films at approximately 1500ânm/min could be achieved at room temperature. Fourier-transform infrared spectroscopy (FT-IR) measurement results suggest that the films deposited are primarily formed as one-dimensional chains of (-CF2-)n which are partially cross-linked. The cross-link density increases with increasing deposition temperature, which improves the thermal stability. However, the dielectric constant of the films increased abruptly above 300â°C. The dielectric constant and leakage current at 1.0âMV/cm of the film deposited at room temperature were approximately 2.1 and 2.0Ã10â9âA/cm2, respectively.
Journal: Applied Surface Science - Volume 252, Issue 22, 15 September 2006, Pages 7774-7780