کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5370541 1388499 2005 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition
چکیده انگلیسی

The nanoindentation characterizations and mechanical properties of fluorine-doped tin oxide (SnO2:F) films deposited on glass substrates, using chemical vapor deposition (CVD) method, were studied, which included the effects of the indentation loads, the loading time and the hold time on the thin film. The surface roughness, fractal dimension and frictional coefficient were also studied by varying the freon flow rates. X-ray diffraction (XRD), atomic force microscopy (AFM) and frictional force microscopy (FFM) were used to analyze the morphology of the microstructure. The results showed that crystalline structure of the film had a high intensity (1 1 0) peak orientation, especially at a low freon flow rate. According to the nanoindentation records, the Young's modulus ranged from 62.4 to 75.1 GPa and the hardness ranged from 5.1 to 9.9 GPa at a freon flow rate of 8000 sccm. The changes in measured properties were due to changing loading rate.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 5, 15 December 2005, Pages 1863-1869
نویسندگان
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