Self-propelled motion of Au-Si droplets on Si(111) mediated by monoatomic step dissolution

By Low Energy Electron Microscopy, we show that the spontaneous motion of gold droplets on silicon (111) is chemically driven: the droplets tend to dissolve silicon monoatomic steps to reach the temperature-dependent Au-Si equilibrium stoichiometry. According to the droplet size, the motion details are different. In the first stages of Au deposition small droplets nucleate at steps and move continuously on single terraces. The droplets temporarily pin at each step they meet during their motion. During pinning, the growing droplets become supersaturated in Au. They depin from the steps when a notch nucleate on the upper step. Then the droplets climb up and locally dissolve the Si steps, leaving behind them deep tracks formed by notched steps. Measurements of the dissolution rate and the displacement lengths enable us to describe quantitatively the motion mechanism, also in terms of anisotropy of Si dissolution kinetics. Scaling laws for the droplet position as a function of time are proposed: x ∝ tn with 1/3 < n < 2/3.