Thin film characterisation of chromium disilicide

► CrSi2 films were fabricated by using co-deposition and post-annealing treatment. ► The silicide films were characterised by means of XRD and XPS. ► Ambiguous shift of the Cr2p3/2 peak of CrSi2 from Cr in the XPS analysis ► Compensation of the initial- and final-state effects causes the ambiguity. ► The possible silicides were predicted by Pretorius' EHF model.