کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5424427 1395823 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)
چکیده انگلیسی
The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ∼6 × 10−19 cm2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ∼0.02 electrons/photon at 92 eV.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 602, Issue 20, 15 October 2008, Pages 3220-3224
نویسندگان
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