کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5425494 1395857 2006 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Molecular view of copper deposition chemistry: (Hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) on a Si(1 0 0)-2 Ã— 1 surface
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Molecular view of copper deposition chemistry: (Hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) on a Si(1 0 0)-2 Ã— 1 surface
چکیده انگلیسی

The chemistry of a common copper deposition precursor, (hexafluoroacetylacetonate)Cu(vinyltrimethylsilane), (hfac)Cu(VTMS), on a single crystal Si(1 0 0)-2 × 1 surface is described at the molecular level using a combination of experimental surface analytical techniques under ultra-high vacuum conditions with computational analysis. At a cryogenic temperature of 100 K, (hfac)Cu(VTMS) adsorbs on this surface molecularly, without noticeable decomposition. Upon surface annealing, VTMS is easily released into the gas phase below the room temperature, while the hfac ligand is bound to the surface through the copper atom. When (hfac)Cu(VTMS) is adsorbed at room temperature, VTMS is released into the gas phase immediately, leaving surface adsorbate analogous in structure to the one formed by adsorption at cryogenic temperature and a brief annealing to room temperature. Upon surface annealing, the hfac ligand decomposes and constitutes the main source of impurities in copper deposition process.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 600, Issue 16, 15 August 2006, Pages 3313-3320
نویسندگان
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