کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5425556 1395860 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of diffusion length on the nucleation of chemical vapour deposition diamond
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Effect of diffusion length on the nucleation of chemical vapour deposition diamond
چکیده انگلیسی

Atomic steps have been suggested as preferential sites for nucleation. However, evidence from recent experiments on diamond growth using faceted sapphire as well as reconstructed silicon substrates shows that atomic steps alone do not always enhance nucleation in the chemical vapour deposition environment. The comparison of the diffusion length of the nucleation precursors and the width of the terraces between the surface steps provides further insights into this nucleation mechanism.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 601, Issue 24, 15 December 2007, Pages 5736-5739
نویسندگان
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