کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5426378 | 1395889 | 2006 | 6 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: X-ray initiated molecular photochemistry of Cl-containing adsorbates on a Si(1 0 0) surface using synchrotron radiation X-ray initiated molecular photochemistry of Cl-containing adsorbates on a Si(1 0 0) surface using synchrotron radiation](/preview/png/5426378.png)
X-ray initiated molecular photochemistry for SiCl4 and CCl4 adsorbed on Si(1Â 0Â 0) at â¼90Â K following Cl 2p core-level excitation is investigated by photon stimulated ion desorption and ion kinetic energy distribution measurements. The Cl 2pâ8a1â excitation of solid SiCl4 induces the significant enhancement (â¼900%) of the Cl+ yield, while the Cl 2pâ7a1â excitation of condensed CCl4 leads to a moderate enhancement (â¼500%) of the Cl+ yield. The enhancement of Cl+ yield at the specific core-excited states is strongly correlated to the ion escaped energy. Upon X-ray exposure for CCl4 adsorbed on Si(1Â 0Â 0) (20-L exposure), the Cl+ yields at 7a1â resonances decrease and new structures at higher photon energies are observed. Cl+ yields at these new resonances are significantly enhanced compared to those at other resonances. These changes are the results of desorption and surface reaction of the CCl4-Si surface complex due to X-ray irradiation. We have demonstrated that state-specific enhancement of ion desorption can be successfully applied to characterize the reaction dynamics of adsorbates adsorbed on surfaces by X-ray irradiation.
Journal: Surface Science - Volume 600, Issue 18, 15 September 2006, Pages 3544-3549