کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5426604 | 1395892 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
An XPS study on the surface reduction of V2O5(0 0 1) induced by Ar+ ion bombardment
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: An XPS study on the surface reduction of V2O5(0 0 1) induced by Ar+ ion bombardment An XPS study on the surface reduction of V2O5(0 0 1) induced by Ar+ ion bombardment](/preview/png/5426604.png)
چکیده انگلیسی
The effect of the irradiation with Al Kα X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(0 0 1) crystal was examined. Afterwards, the surface reduction of the V2O5(0 0 1) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(0 0 1) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 600, Issue 17, 1 September 2006, Pages 3512-3517
Journal: Surface Science - Volume 600, Issue 17, 1 September 2006, Pages 3512-3517
نویسندگان
Geert Silversmit, Diederik Depla, Hilde Poelman, Guy B. Marin, Roger De Gryse,