کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
543811 871684 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructure analysis in strained-InGaN/GaN multiple quantum wells
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Microstructure analysis in strained-InGaN/GaN multiple quantum wells
چکیده انگلیسی

The barrier thickness effect on the energy and microstructure properties of InGaN/GaN multiple quantum wells is investigated with Stillinger–Weber potential. The calculation indicates that the energy of a quantum well increases as the GaN barrier thickness rises, and that Ga–N and In–N bonds are shrunk with respect to those of random InGaN alloy. Moreover, a critical value of the barrier thickness exits. If the barrier thickness exceeds the critical value, the bond length of Ga–N in quantum wells reduces as a function of indium concentration. This singular behavior of Ga–N bond is analyzed with a force balance model.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Journal - Volume 40, Issue 2, February 2009, Pages 342–345
نویسندگان
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