کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5438346 | 1398183 | 2017 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Enhanced photocatalytic activity of TiO2-ZnO thin films deposited by dc reactive magnetron sputtering
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
The effect of deposition conditions on the photocatalytic activity of TiO2-ZnO thin films was studied. By using a (Ti)90-(Zn)10 alloy target, the samples were deposited at room temperature on glass substrates by dc reactive magnetron sputtering and post-annealed in air at 500 °C. The dependence of the physical properties of the films on the O2/Ar gas ratio and the deposition working pressure was investigated. XRD patterns showed mainly the formation of the anatase phase of TiO2. Optical absorption measurements exhibited a blue shift of the band-gap energy with increasing working pressure. XPS spectra indicated the presence of the Ti4+ and Zn2+ oxidation states, which correspond to TiO2 and ZnO, respectively. The chemical state of Ti was further analyzed by means of the modified Auger parameter, α', which gave a value of ca. 873 eV. The photocatalytic property of the films was assessed by the degradation of a methylene blue aqueous solution. The maximum photocatalytic performance was observed for the samples deposited at 3.0 mTorr and O2/Ar gas ratio of 10/90. These results are explained in terms of the structural, optical, and morphological properties of the films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ceramics International - Volume 43, Issue 12, 15 August 2017, Pages 8831-8838
Journal: Ceramics International - Volume 43, Issue 12, 15 August 2017, Pages 8831-8838
نویسندگان
M. Pérez-González, S.A. Tomás, J. Santoyo-Salazar, M. Morales-Luna,