کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5438533 | 1398185 | 2017 | 29 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering](/preview/png/5438533.png)
چکیده انگلیسی
The deposition rate, transmittance and resistivity of aluminium-doped zinc oxide (AZO) films deposited via radio frequency (r.f.) sputtering change with target thickness. An effective method to control and maintain AZO film properties was developed. The strategy only involved the regulation of target bias voltage of r.f. magnetron sputtering system. The target bias voltage considerably influenced AZO film resistivity. The resistivity of the as-deposited AZO film was 9.82Ã10â4 Ω cm with power density of 2.19 W/cm2 at target self-bias of â72 V. However, it decreased to 5.98Ã10â4 Ω cm when the target bias voltage was increased to â112 V by applying d.c. voltage. Both growth rate and optical band gap of AZO film increased with the absolute value of target bias voltage - growth rate increased from 10.54 nm/min to 25.14 nm/min, and band gap increased from 3.57eV to 3.71 eV when target bias voltage increased from â72 V to â112 V at r.f. power density of 2.19 W/cm2. The morphology of AZO films was slightly affected by the target bias voltage. Regulating target bias voltage is an effective method to obtain high-quality AZO thin films deposited via r.f. magnetron sputtering. It is also a good choice to maintain the quality of AZO film in uptime manufacturing deposition.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ceramics International - Volume 43, Issue 10, July 2017, Pages 7543-7551
Journal: Ceramics International - Volume 43, Issue 10, July 2017, Pages 7543-7551
نویسندگان
Zhongming Du, Xiangxin Liu, Yufeng Zhang,