کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5441449 | 1510387 | 2017 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low frequency noise in hydrogenated p-type amorphous silicon thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Low frequency noise in hydrogenated p-type amorphous silicon thin films Low frequency noise in hydrogenated p-type amorphous silicon thin films](/preview/png/5441449.png)
چکیده انگلیسی
We report on electrical noise measurements of p-type a-Si:H thin films prepared by plasma enhanced chemical vapor deposition. Samples were grown at various boron concentrations and hydrogen dilution of the silane precursor. Measurements were made at temperatures ranging from 210 K to 450 K. In this temperature range, Mott variable range hopping conduction describes the electrical conductivity, and the noise has a 1/fγ component. The exponent γ for temperatures below 400 K is approximately 1, and the noise follows the Hooge model. For temperatures between 240 K and 380 K, the 1/f noise was found to be independent of the conductivity. Therefore, the carrier concentration does not change appreciably with temperature and the change in conductivity is due to the temperature dependence of the hole mobility. The normalized Hooge parameter correlates with the Mott hopping parameter, T0M, and in turn, to the material dopant boron concentration and hydrogen dilution levels. For temperatures above 400 K, the frequency exponent, γ, is larger than 1, indicative of a generation-recombination trap contribution to the noise. From the dependence of the normalized Hooge parameter to the Mott characteristic temperature T0M, we conclude that the electrical 1/f noise in p-type a-Si:H is associated with hopping conduction.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 459, 1 March 2017, Pages 176-183
Journal: Journal of Non-Crystalline Solids - Volume 459, 1 March 2017, Pages 176-183
نویسندگان
V.C. Lopes, A.J. Syllaios, C.L. Littler,