Effect of O2/Ar flow ratio on Ga and Al co-doped ZnO thin films by rf sputtering for optoelectronic device fabrication

Effect of O2/Ar flow ratio on Ga and Al co-doped ZnO thin films by rf sputtering for optoelectronic device fabrication

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Research Bulletin - Volume 95, November 2017, Pages 123-128

E. Muchuweni, T.S. Sathiaraj, H. Nyakotyo,