Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations

Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Computational Materials Science - Volume 131, 15 April 2017, Pages 230-238

Jialin Wen, Tianbao Ma, Weiwei Zhang, Adri C.T. van Duin, Xinchun Lu,